NCG030156_DMR_20200610

Semi-annual Stormwater Discharge Monitoring Report
for North Carolina Division of Water Quality General Permit No. NCG030000
Date submitted
CERTIFICATE OF COVERAGE NO. NCG03 0�5 I
FACILITY NAME 6rtro .cs Zr�C.
COUNTY i�1att-t
PERSON COLLATING SAMPLES a.n.C.S u.L
LABORATORY I4a,a A.,A r. 1-t to k Lab Cert. #
Comments on sample collection or analysis:
Part A: Stormwater Benchmarks and Monitoring Results
SAMPLE COLLECTION YEAR 262()
SAMPLE PERIOD gJan-June ❑July -Dec
or ❑ Monthly' (month)
?�o DISCHARGING TO CLASS ❑ORW ❑HQW []Trout ❑PNA
❑Zero -flow ❑Water Supply ❑SA
JUN 23 202p ❑other
C�WVO I f "'�L FILE, PLEASE REMEMBER TO SIGN ON PAGES 2 AND/OR 3
R S�:C710A;
n No discharge this period?2
Outfall No.
Date Sample
Collected'
(mo/dd/yr)
24hour rainfall
amount,
Inches'
Total Suspended Solids
pH,
Standard units
Copper
Lead
Zinc
Non-Polar O&G/
Total Petroleum
Hydrocarbons
Total Toxic
Organicss
Benchmarks =__>
100 mg/L or 50 mg/L'
6.0 - 9.0
0.007 mg/L
0.033 mg/L
0.067 mg/L
15 mg/L
1 mg/L
4-3a-La
t.
7.
17.62,
6.ta
-6b3
d.6/2.
nl
1.62,
D-ab
6.663
10.07
A)
4 0U
1.L
r
.ol-
g.U)
•66
17,
IV A
' Monthly sampling (instead of semi-annual) must begin with the second consecutive benchmark exceedance for the same parameter at the same outfall.
i For sampling periods with no discharge at any single outfall, you must still submit this discharge monitoring report with a checkmark here.
3The total precipitation must be recorded using data from an on -site rain gauge. Unattended sites may be eligible for a waiver of the rain gauge requirement.
See General Permit, Table 3 identifying the especially sensitive receiving water classifications where the more protective benchmark applies.
S Total Toxic Organics sampling is applicable only for those facilities which perform metal finishing operations, manufacture semiconductors, manufacture
electronic crystals, or manufacture cathode ray tubes. For purposes of this permit the definition of Total Toxic Organics is that definition contained in the EPA
Effluent Guidelines for the facility subject to the requirement to sample (for metal finishing use the definition as found in 40 CFR 433.11; for semiconductor
manufacture use the definition as found in 40 CFR 469.12; for electronic crystal manufacture use the definition as found in 40 CFR 469.22; and for cathode ray
tube manufacture use the definition found in 40 CFR 469.31).
Permit Date:11/1/2012-10/31/2017 SWU-245, last revised 10/25/2012
Page 1 of 3

C p
O io
C N E O 0
O (7 LO
W U W C
« p O
L Y a >
O C
w N N >O
Y L
E O L «
v E F _
Y C L
� C W
� v 3
W E tYYo E io «
Y O u O C
v `p 0
c r u m y E
O E v
r ai o 3 n
E E E
UU 00 0 O ^
C C in T
m
T W C E Y z
m p v O w
'N
� a
O
E u u
C OU
v U p p U
v c o v
n W L
m to O W C
c C) u
o s m
x T m u 4% C
0 O W o 0 a
o « E v c
v 0 o m .o
Y O M C C
C
E m a n v
E
0 O ?' C O d
V n C a 0 0
W =
« o LO
p W 4c
C C 0 C h N
in 0 m 3
c v E
c ° « o
a « v v
c n 3 min
W oa ° `o c w.
NO C Y W C
C C E O> u
v Wr E o
N ,� v ti
E WE Yo no-a�
C ro C « v u
C
O E N O Y O
Y W L N n
o c m O m
N Q) D L C
Y >
Co p = T« o E
C, W E z 2 m
o f a E v m
c p u o f
�_>
« 0 O O O >
3 LL m o
U E
LL E a.
E
�
w
C
C
W
a
�
E
v
c
�
m
0
� U
U
W W
i
� W k
C 0 Y
O O
C `
L � W
E — n
L E
Y
O O W L
O c h C
a O .
m E
x C y <
W x y ar
v O
0 3 m
3
z, W c
J J ~ 0
� O O
a
v ry" to
X W Ln
0 v h N
O] : A
Y to
E `0 m =
J E
CO w G
_ y O O/
u N� Y
Y L VI
o W E w
N �<
p N u
W O C
m W C
o 'o '12
d
O Y O
C
Y
O O U 7
Y W Gl
N Y
E .- c
_° W o O`
0 L M M
U v 0
� U C
E a w m
c W � w
C L
W O u
r v E _W
a s E 4 C
u <�
d N N
N C
.a _Y <o� 'Co
Y Y l C
N
3 v .E °n a)
E c en W u
a L )
0 >
D d
Ip my
z Z a
a
�
�
l
N
IV
a. a
O
O1
H
I
G
O
W
a
j N
O
p\p
W
O
7 v
n
N
O
a
J
m
E
N
O
O
f
O
�
T
=
W
a =
H
U'
e0
a�
c a
O W
Z
N
c
mW
A C
0
a s
a E c
s �
V
N
W
E � vm �
W \
W O
E
am u0
n
O
Z
p
�
o
o
=
u
G
m
a
0
ry
N
O
m m
^ o
N N
� v