NCG030537_DMR_20210528

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Stormwater Discharge Monitoring Report
for North Carolina Division of Energy, Mineral and Land Resources General Permit No. NCG030000
Date submitted QS 1%
CERTIFICATE OF COVERAGE NO. NCG03Q 5 S _-
FACILITY NAME Drzuo NifKJ W!: inr —S•rQ.'ria('VWP_PIUrtt—
COUNTY Weda
PERSON COLLECTING SAMPLES
LABORATORY Lab Cart. N 44L4-0
Comments on sample collection or analysis:
Part A: Stormwater Benchmarks and Monitoring Results
SAMPLE COLLECTION YEAR 20'24
SAMPLE PERIOD ❑ Jan -June ❑ July -Dec
or 14monthly' JI�.QI� /month)
DISCHARGING TO CLASS ❑ORW ❑HQW ❑Trout ❑PNA
',Zero -Row ❑Watersupply ❑SA
Other Glass C
PLEASE REMEMBER TO SIGN ON PAGES 2 AND/OR 3 4
❑ No discharge this period?'
Outfall No.
Date Sample
ate Sated'
(mo/dd/yr)
24-hour rainfall
amount,
Inches'
Total Suspended Solids
pH,
Standard units
Total Copper
Total Lead
Total Zinc
Non -Polar O&G/
Total PetroleumCol
Hydrocarbons
Total Toxic
Organics'
Benchmarks
-
-
100 mg/L or 50 mg/L4
6.0-9.0
0.010 mg/L
0.075 mg/L
0.126 mg/L
15 mg/L
1 mg/L
Parameter Code
-
46529
C0530
0040D
01119
01051
01094
o05s2
78141
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1.50"
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6,111
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waived
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' Monthly sampling (instead of semi-annual) must begin with the second consecutive benchmark exceedance for the same parameter at the same outtall.
2 For sampling periods with no discharge at any single outfall, you must still submit this discharge monitoring report with a checkmark here. OENTRAL FILES
3The total precipitation must be recorded using data from an on -site rain gauge. Unattended sites may be eligible for a waiver of the rain gauge requiremeDWR SECTION
4 See General Permit, Section B, Table 1 to identify the especially sensitive receiving water classifications where the more protective benchmark applies.
5 Total Toxic Organics sampling is applicable only for those facilities which perform metal finishing operations, manufacture semiconductors, manufacture
electronic crystals, or manufacture cathode ray tubes. For purposes of this permit the definition of Total Toxic Organics is that definition contained in the EPA
Effluent Guidelines for the facility subject to the requirement to sample (for metal finishing use the definition as found in 40 CFR 433.11; for semiconductor
manufacture use the definition as found in 40 CFR 469,12; for electronic crystal manufacture use the definition as found in 40 CFR 469.22; and for cathode ray
tube manufacture use the definition found in 40 CFR 469.31).
Permit Date: ll/1/2018-05/31/2021
SWU-245, last revised 11/1/2018
Page 1 of 3
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